Plasma Sources for Thin Film Deposition and Etching

49.46 LEI
54.95 LEI
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Description

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.

Details
  • ISBN: 9780125330183
Sold By: Prior Books Total Items: 86171
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